A vacuum deposition apparatus for depositing metal thin films or catalyst thin films on substrates with a high degree of accuracy and in a large quantity of samples.
Features:
・ Turbo-molecular pump is equipped so that clean vacuum is realized.
・ All pumping processes run automatically only by pushing the start button.
・ Two kinds of metal sources can be alternately deposited.
・ Highly-sensitive film-thickness monitor is equipped for sub-nanometer thin film deposition.
・ Our unique in-situ rotatable cubic sample holder gives 4 times increase of the yield per lot.
・ Special sample holder for sample preparation in a groove box is also possible optionally, by which samples will never be exposed to the air until the deposition process is finished.
Main Specifications:
Vacuum chamber
Pyrex glass chamber 210mmφ150mm.
Substrate holder
360°rotatale cubic substrate holder, 4 faces, 100mmx100mm for each face.
Evaporation source
2 sets of electrodes, 2 evaporation sources.
Vacuum system
Turbo molecular pump 67L/sec, rotary pump 38L/sec., penning gauge, automatic operation
Degree of vacuum
1×10-4Pa(7.5×10-7Torr)
Film thickness monitor
crystal oscillator, minimum 0.01nm, max. 100nm
Power requirement
220V, 200 Watt
