AX-7670 0190-47768 AMAT HDP CVD MKS 反应气体发生器 消除了加工过程中对氩气的需求

ASTRON®i反应气体发生器专为提高流动能力和工艺灵活性而设计。ASTRONi反应气体发生器消除了加工过程中对氩气的需求，允许选择与现有工艺气体兼容的点火气体，并增加了总体流量，减少了加工时间，提高了吞吐量。
ASTRONi反应气体发生器基于的低场环形等离子体技术，可提供更大范围的工作压力，同时保持较高的输入气体解离率。高可靠性、经过现场验证的设计架构结合了电源、控制模块和等离子体室。其结果是一个紧凑的，盖子安装的单位，这是很容易集成。
ASTRONi反应气体发生器的主要应用是作为反应气体的远程源，用于清除CVD或FPD工艺室内壁上不需要的沉积物，这些工艺室需要更大的工艺灵活性。通过产生氟原子，与室内的废物沉积发生反应，形成新的气体，这些气体很容易被洗涤，以尽量减少对环境的影响。此外，与原位射频方法相比，远程源减少了对工艺室的磨损。

•操作过程中不需要氩气
•增加流量减少腔室清洁时间
•连续运行(CW)，不受占空比限制，支持大型腔室和/或长时间清洁
•兼容200mm和300mm腔室

选择点火气体的灵活性和较低的CoO
•紧凑，盖子安装设计，便于集成
•在宽压力范围内的高解离率，更强大的操作与室清洁硬件配置

The ASTRON®i reactive gas generator is designed for increased flow capability and process flexibility. The ASTRONi reactive gas generator eliminates the need for argon during processing, allows a choice of ignition gas compatible with existing process gases, and increases overall flow for decreased processing time and increased throughput.
Based on patented Low-Field-Toroidal plasma technology, the ASTRONi reactive gas generator provides a broader range of operating pressures while maintaining a high input gas dissociation rate. The high reliability, field-proven design architecture combines the power source, control module, and plasma chamber. The result is a compact, lid-mountable unit, which is easy to integrate.
The primary application for the ASTRONi reactive gas generator is as a remote source for reactive gas to clean undesired deposits from interior walls of CVD or FPD process chambers where greater process flexibility is required. By generating atomic fluorine that reacts with waste deposits in the chamber, new gases are formed that are readily scrubbed to minimize the environmental impact. In addition, the remote source reduces wear and tear on the process chamber compared to in situ RF methods.

• No Argon required during operation
• Increased flow reduces chamber clean time
• Continuous operation (CW), not duty cycle limited, to support large chambers and/or long clean times
• Compatible with 200mm and 300mm chambers

Choice of ignition gases for flexibility and lower CoO
• Compact, lid-mountable design, for easy integration
• High dissociation rate over broad pressure range for more robust operation with chamber clean hardware configurations